Manganese Precursors for Area Selective Deposition (ASD) by Photoassisted Chemical Vapor Deposition (PACVD)

Bishwaprava Das, Randall Lane Holliday, Amy V. Walker, Lisa McElwee-White

University of Florida, University of Texas at Dallas

Alkyl manganese pentacarbonyls [RMn(CO)₅] have been prepared and screened as potential precursors for room temperature Area Selective Deposition (ASD) of Mn on functionalized self-assembled monolayers (SAMs) using photoassisted chemical vapor deposition (PACVD). The complexes are good candidates for ASD because they have high volatility, high quantum yields for ligand loss and metal alkyl groups to interact with acidic or nucleophilic terminal groups on the SAM surface.  Selective reactivity with one component of –COOH/–CH₃ and –OH/–CH₃ terminated patterned SAMs can then lead to ASD.  In this project, the [RMn(CO)₅] complexes are screened as PACVD precursors by determining their volatility and identifying their photochemical ligand loss reactions that generate reactive intermediates for interaction with the SAM surface. Precursors that are deemed suitable after screening are then evaluated for PACVD on functionalized SAMs.