| Name | Ms. Anjali Sharma |
|---|---|
| Organization or Institution | University of Florida |
| Topic | Inorganic Chemistry |
| Title | Aerosol-assisted chemical vapor deposition of tungsten oxide and nitride films |
| Author(s) | Anjali Sharma, Taehoon Kim, Lisa McElwee-White |
| Author Institution(s) | Department of Chemistry, University of Florida, Gainesville, FL 32611-7200, USA |
| Abstract | Tungsten oxide and oxynitride (WOx/WOxNy) are promising materials in the field of gas sensors, OLEDs, batteries, and catalysis. The tungsten nitrido alkoxide complex, WN(OtBu)3 was synthesized as a potential precursor for the deposition of WOx or N-doped WOx (WOxNy). The thermal properties of the precursor were analyzed by gas chromatography-mass spectrometry (GC-MS) and thermogravimetric analysis (TGA). It was found that WN(OtBu)3 decomposes before sublimation due to thermal instability of the precursor. To avoid problems with volatility, aerosol-assisted chemical vapor deposition (AACVD) is used to fabricate WOxNy films on Si substrates. The films were further characterized using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The AACVD fabricated WOxNy film has shown improved thermal stability as well as electrical conductivity owing to the nitrogen doping into the tungsten oxide lattice.
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